Lower-temperature processing
Vacuum can support drying, evaporation and concentration at reduced boiling temperatures where the process permits.
APPLICATIONS · CHEMICAL & PROCESS
Vacuum engineered around the process load.
Drying, distillation and evaporation duties are assessed using real gas and vapour loads, suction temperature, material compatibility and the required operating pressure.
CHEMICAL PROCESS VACUUMGas + vapour + temperatureOne integrated selection
PROCESS ROLE
Control pressure while managing vapour and condensables.
Ultimate pressure alone does not define a chemical-process vacuum system. Vapour composition, condensable load, corrosion risk, service-liquid temperature and the intended operating pattern determine the complete arrangement.
Controlled vapour removal
Gas and vapour are removed at a defined operating pressure to support stable process conditions.
Protected vacuum equipment
Condensers, separators and knock-out vessels help manage liquid and condensable carry-over before the pump.
Process-compatible construction
Materials, seals and service liquid are selected around the handled gas and chemical environment.
VACUUM DRYING
Manage the vapour before it reaches the pump.
The condenser and separation arrangement is sized from the actual evaporation rate, gas composition, suction temperature and cooling conditions.
SELECTING THE RIGHT SYSTEM
Select the system from the real process duty.
The starting point is a clear definition of the process and utility conditions.
Talk to Our Technical TeamTarget operating pressure
Define the normal pressure range, start-up condition and any transient operating points.
Gas and vapour load
Provide composition, mass flow, condensable fraction, suction temperature and expected liquid carry-over.
Materials and service liquid
Review corrosion, contamination limits, seal compatibility and available service-liquid quality.
Duty and system controls
Continuous or batch duty, redundancy, instrumentation and cleaning requirements shape the architecture.
RELATED SOLUTION FAMILIES
Liquid ring technologies for wet and vapour-laden duties.
Family ranges are indicative. Actual performance changes with suction conditions and service-liquid temperature.
CLOSE-COUPLED LIQUID RING
LRV Series
- Capacity
- 25–455 m³/h
- Pressure / duty
- 33 mbar(a)
- System role
- Compact wet-gas duties
SINGLE-STAGE LIQUID RING
ZVT Series
- Capacity
- 650–3700 m³/h
- Pressure / duty
- 40–100 mbar(a)
- System role
- High-capacity process duty
TWO-STAGE LIQUID RING
ZVK Series
- Capacity
- 280–2100 m³/h
- Pressure / duty
- 33–40 mbar(a)
- System role
- Deeper liquid ring vacuum
Published family ranges are indicative. Final selection must be checked at the actual operating pressure, gas or material load, temperature, duty cycle and installation conditions.
APPLICATION ENGINEERING
The vacuum source is one part of the complete system.
Reliable performance depends on the pump or blower, protection equipment, line arrangement, controls and the real process operating point.
Operating point
Capacity and pressure are checked together at the actual inlet conditions and duty cycle.
Share Operating DataProtection equipment
Filters, separators, condensers, receivers and valves are selected around moisture, particles, liquid carry-over and process risk.
Review the Process LoadSystem integration
Pipework, controls, isolation, accessibility and redundancy are included in the final system architecture.
Explore Liquid Ring PumpsLET'S REVIEW YOUR APPLICATION
Request a Technical Review Share your chemical-process operating data.
Provide the gas and vapour composition, flow, suction temperature, target pressure, materials, service-liquid conditions and duty cycle for a technical review.